Lithography is one of most used technology in MEMS fabrication. Lithography can transfer patterns from photomask to photoresist via contact printing, proximity printing or project printing. Lithography usually includes wafer clean, spin coating, soft-bake, alignment, exposure, development, hard-bake, etching and measurement etc.
MiNAN provides various lithography service:
1. Electron beam lithography: minimum line width 8nm, precision +/-10nm
2. Contact printing: minimum line width 0.8um, multi-layer alignment with precision <0.5um, 2in to 8in wafer size.