MEMS

Photomask

A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern. They are commonly used in photolithography and the production of microfluidic patterns.

MiNAN's photomask is made by quartz glass and soda glasses with following spec:

1. Minimum line width 1.5um, resolution 0.2um

2. 4in~6in wafer photolithography

Our customer can provide CAD file and we provide Mask Design for approval.

 

We provide 1~2 weeks time fabrication service.